Contact Resistances to n- and p-type 2D Semiconductors MoS2and WSe2with Moire Lattice Interfaces
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DOI码:10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134429
发表刊物:2023 International VLSI Symposium on Technology, Systems and Applications, VLSI-TSA/VLSI-DAT 2023 - Proceedings
是否译文:否
发表时间:1905-07-15