- Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide
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- 发表刊物: ANALYTICA CHIMICA ACTA
- 卷号: 433
- 期号: 2
- ISSN号: 0003-2670
- 是否译文: 否
- 发表时间: 2001-01-01
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