Enhancement of saturation magnetization in Cr-ion implanted silicon by high temperature annealing
发布时间：2020-05-25 点击次数：
发表刊物：Applied Surface Science 257 (20), 8465– 8468 (2011)
通讯作者：Shuang Yang（本科生）, Wenyong Zhang, Jihong Chen, Zhongpo Zhou, Zhiwei Ai, Liping Guo*(通讯作者), Congxiao Liu, Honglin Du.
是否译文：否
收录刊物：SCI
